Development of a distributed ferromagnetic enhanced inductively coupled plasma source for plasma processing
نویسندگان
چکیده
منابع مشابه
Plasma Characteristics Using Superimposed Dual Frequency Inductively Coupled Plasma Source for Next Generation Device Processing.
U-shaped inductively coupled plasma (ICP) source was investigated as a linear plasma source for the next generation roll-to-toll flexible display processing. For the radio frequency power to the source, the dual frequency composed of 13.56 MHz and 2 MHz was used and the effect of dual frequency to the U-shaped ICP source on the plasma density, electron temperature, and plasma uniformity was inv...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2019
ISSN: 1742-6588,1742-6596
DOI: 10.1088/1742-6596/1243/1/012004